Замечания:1 创始人: Site Editor Publish Time: 2026-01-02 Origin: Веб - сайт
SiP Package Bumping Process Technical
Specification and Practical Guide
The semiconductor industry is undergoing a
strategic transformation from "Moore's Law" to "More than
Moore." Chip design no longer solely pursues the miniaturization of
process nodes but achieves multi-chip heterogeneous integration through
System-in-Package (SiP) technology, maximizing functionality and customization
requirements within the smallest space. Leveraging its advantages of
high-density integration, rapid time-to-market, and flexible customization, SiP
packaging technology has become a core supporting technology in fields such as
consumer electronics, the Internet of Things (IoT), and intelligent driving.
According to predictions from industry research institutions, the global SiP
market size will exceed $30 billion by 2025, with a compound annual growth rate
remaining above 15%. In the entire process flow of SiP packaging, the bumping
process, as a key step in achieving electrical connection between the chip and
the substrate, directly determines the conduction performance and long-term
reliability of the package, making it one of the core indicators for measuring
SiP manufacturing capability.
Spherical Terminal Types and Bumping Method
System
As the bridge connecting the chip to the
external circuit, the selection of spherical terminals for SiP packaging must
consider electrical performance, mechanical strength, and process
compatibility. According to the IPC-7095 "Design and Assembly Process
Implementation for BGAs" industry standard, spherical terminals are mainly
divided into three categories: Solder Bump: Micro solder protrusions formed by
electroplating or printing, with a typical height of 20–50Мm, suitable for ultra-fine pitch (≤0.3mm) chip-level interconnects; Solder Ball: Spherical solder with
a diameter of 0.1–0.76mm, fixed to substrate pads via
the bumping process, currently the most widely used terminal form in SiP
packaging; Copper Pillar Bump: A composite structure with a copper pillar core
and a surface covered by a solder cap, height can reach 100–200Мm, offering excellent current carrying
capacity, suitable for high-power devices. A comparison of the process
characteristics of each terminal type shows: Solder bumps can achieve a minimum
pitch of 0.2mm but require extremely high substrate flatness (≤5Мm/100mm); Solder balls have the widest
process window, with yields reaching over 99.9%, but the pitch is limited by
the ball diameter (typically 1.2 times the ball diameter); Copper pillar bumps
offer the best reliability, capable of withstanding over 1000 temperature
cycles, but the manufacturing cost is 3–5 times that of
solder balls. Enterprises need to select based on product pin count (I/O
count), pitch requirements, and cost budget. AP chips in high-end smartphones
often use copper pillar bumps, while IoT modules primarily use solder balls.
The technological evolution of bumping methods shows a trend of diversified
development, currently forming three main technical routes within the industry:
Solder Paste Printing Bumping Technology
This technology precisely distributes
solder paste onto substrate pads through stencil printing, forming the required
solder bumps after reflow soldering. It is an extension of SMT technology in
the SiP field. Its core advantage lies in equipment compatibility – it can directly utilize existing SMT production line equipment such
as Сварочная паста printers (e.g., DEK NeoHorizon) and reflow ovens, reducing
initial investment costs by over 40%. Practices from a domestic EMS company
indicate that adopting this technology can increase the equipment utilization
rate of an SiP production line to 85%, significantly higher than the 60% of
dedicated bumping lines.
Quality control forСварочная пастаprinting
bumping focuses on two key elements: stencil design and solder paste
performance: Stencil Parameter Optimization: To ensure shape consistency of
bumps after reflow (height deviation ≤5%), stencil
thickness is typically 1.2–1.5 times the target bump
height (e.g., 100Мm stencil thickness for a target
height of 80Мm). Aperture size needs compensation based
on pad size; for a 0.4mm×0.4mm square pad, a 0.38mm×0.38mm aperture is recommended, reserving 20Мm for solder paste squeeze; Void Control: By incorporating
"bridge" structures (width 0.15–0.2mm) within
the stencil apertures, exhaust channels are formed during soldering, reducing
bump voiding from 15% to below 5%. Experimental data shows that a 0.18mm wide
cross-shaped bridge in a 0.6mm diameter circular aperture ensures sufficient
solder paste volume while increasing gas escape efficiency by 3 times; Release
Performance Enhancement: Applying a nano-ceramic coating (thickness 0.5–1Мm) to the stencil surface can reduce release
resistance by 60%, effectively preventing shape distortion caused by solder
paste sticking.

The performance indicators of specialized
SiP solder paste are significantly higher than those of ordinary SMT solder
paste: Fine Pitch Adaptability: Maintains complete formation even with a
minimum aperture of 55Мm, with a printing resolution of
±3Мm; Anti-slumping
Performance: After standing at 25°C for 2 hours, the
line width change rate of the Сварочная паста pattern is ≤5%,
far superior to the 15% of ordinary solder paste; Process Window: The peak
reflow temperature can be adjusted within the 230–250°C range while maintaining a bump height deviation of ≤3%; Residue Control: The post-soldering residue of no-clean solder
paste is ≤0.5mg/cm², with
insulation resistance ≥10¹¹Ω,
meeting no-clean process requirements.
Solder Ball Placement Bumping Technology
System
Solder ball placement bumping is a process
that physically places pre-formed solder balls precisely onto substrate pads.
Based on the operation method, it can be divided into two implementation paths:
automated ball placement machine bumping and stencil-based ball placement
bumping. Both share the core technical challenge of precise alignment between
the solder balls and the pads.
Automated ball placement machine bumping
adopts an automated process of "flux dotting - vacuum pickup - precise
placement." Equipment placement accuracy can reach ±15Мm, suitable for medium to high-volume
production. Its key process control points include: Flux Application Process:
Use a PIN tool matching the pad array to dip flux. PIN diameter is 60–70% of the pad diameter (e.g., 0.2mm PIN for a 0.3mm pad), ensuring
the flux dot diameter is 80–90% of the pad. Squeegee
thickness is selected as 1/3–1/4 of the solder ball
diameter (0.15mm squeegee for 0.5mm balls), achieving uniform flux thickness
(deviation ≤5Мm) through 8–10 reciprocating strokes; Vacuum Pickup/Placement Parameters: Nozzle
diameter is 80–90% of the solder ball diameter (0.35mm
nozzle for 0.4mm ball), vacuum controlled between -30 to -50 kPa. Use a
"soft landing" approach during placement (vacuum drops to -10 kPa
upon contact) to reduce impact on the flux adhesion force; Reflow Environment
Optimization: Using nitrogen protection (oxygen content ≤50 ppm) can reduce solder ball oxidation rate from 3% to 0.1%,
controlling the IMC layer thickness within the ideal 1–2Мm range, significantly improving solder joint reliability.
Stencil-based ball placement bumping
achieves batch positioning of solder balls through stencil guidance. Equipment
cost is only 1/5 that of an automated ball placer, suitable for low-volume
prototyping. Its key process parameters include: Stencil-to-Substrate Gap: Set
to 1/2–2/3 of the solder ball diameter (0.35mm gap for 0.6mm ball), ensuring
smooth ball drop while avoiding positional shift; Solder Ball Filling Method:
Use an anti-static brush (resistance 10⁶–10⁹Ω) to gently sweep the stencil surface at a 45° angle, ensuring each stencil aperture has one and only one solder
ball. After filling, perform a CCD visual inspection for missing balls (should
be ≤0.1%); Separation Speed Control: The separation
speed between stencil and substrate is ≤5mm/s. Using an
angled separation (10–15°) can
further reduce ball lifting, controlling the misplacement rate below 0.05%.
Laser Bumping Technology
As an emerging bumping process, laser
bumping uses a high-energy laser beam (wavelength 1064nm) to instantaneously
melt the solder ball and jet it onto the pad, achieving non-contact soldering.
Its unique advantages include: Localized Heating Characteristic: Laser energy
only acts on the solder ball area (diameter 0.1–0.5mm),
with the overall substrate temperature ≤80°C, effectively protecting heat-sensitive devices; Precision Control:
Achieves ±5Мm placement
accuracy through a galvanometer scanning system, supporting ultra-fine pitches
below 0.2mm; Material Compatibility: Achieves good wetting without flux,
especially suitable for medical electronic products sensitive to residues. The
optimization of laser bumping process parameters is relatively complex,
requiring a balance of the following factors: Laser Power Density: The critical
power density for solder ball melting is 15–20W/mm²; too low leads to incomplete melting, too high causes pad ablation;
Jetting Pressure: Inert gas (nitrogen) pressure is set to 0.1–0.3 MPa, with pressure fluctuation ≤0.02
MPa, ensuring stable solder ball flight trajectory; Cooling Rate: Using
side-blown cold air (-5°C) can achieve a cooling rate
of 100°C/ms, refining the solder joint grain structure
and increasing strength by 15–20%. Currently, the
equipment investment for laser bumping is 2–3 times
that of an automated ball placer, and its production efficiency (approx. 3000
balls/hour) is only 1/5 that of an automated ball placer, primarily applied in
high-end fields like aerospace.
Material Characteristics Control and
Management Specifications
The quality stability of the bumping
process largely depends on material consistency. The control of flux, solder
ball, and substrate characteristics forms the foundation of quality assurance.
Flux Technical Requirements and Management
Flux serves three functions during the
bumping process: oxidation barrier (forming a protective film during
soldering), oxide removal (activating the metal surface), and temporary
fixation (adhesion during the ball placement stage). Its performance indicators
must meet: Viscosity Characteristics: Viscosity at 25°C
should be in the range of 1000–3000 cP, ensuring
formability during PIN tool dipping while providing sufficient adhesive force (≥0.5N) to prevent ball drop-off; Activity Level: According to IPC J-STD-004
standard, RMA grade (moderately active) flux is recommended, with acid value
controlled between 20–50 mg KOH/g, effectively removing
oxides while avoiding excessive corrosion; Volatile Residue: Post-soldering
residue should be ≤1.0 mg/cm²,
and insulation resistance should be ≥10¹¹Ω (under 40°C/90% RH conditions), meeting
no-clean process requirements. Flux storage and usage management strictly
follow the "First-In-First-Out" principle: Storage Environment:
Sealed state, temperature ≤30°C,
relative humidity 40–60% RH, away from direct sunlight
and heat sources; Shelf Life Control: Calculated from the production date,
storage period ≤6 months; after opening, must be used
within 72 hours; Handling After Opening: Stir for 5–10
minutes before each use (speed 300 rpm) to ensure uniform composition. Unused
flux should be stored separately and not mixed with new flux.
Full Lifecycle Control of Solder Balls
The composition and dimensional accuracy of
solder balls directly affect the electrical and mechanical properties of the
solder joints. Their technical parameter control is extremely strict:
Alloy Composition: Leaded solder balls are
primarily Sn63Pb37 (melting point 183°C), while
lead-free solder balls are mainly Sn96.5Ag3.5 (melting point 221°C) and Sn96.5Ag3Cu0.5 (melting point 217°C),
with composition deviation ≤0.1% (mass ratio);
Dimensional Accuracy: Diameter deviation ≤±0.01 mm,
sphericity ≥0.95 (ideal sphere is 1.0), surface
roughness Ra ≤0.1 Мm, ensuring
consistency during soldering; Oxidation Control: Solder ball surface oxide
layer thickness ≤5 nm, detectable by XPS; exceeding 10
nm leads to poor wetting. Solder ball storage conditions are crucial for
preventing oxidation: Packaging Method: Use nitrogen-purged sealed aluminum
foil bags, with 5000–10000 balls per bag, avoiding
frequent opening; Storage Environment: Temperature 25±10°C, relative humidity ≤60% RH. Unused balls
after opening should be stored in a nitrogen dry cabinet (oxygen content ≤100 ppm); Expiry Management: Storage period is 12 months from the
production date. Balls exceeding this period require solderability testing (wetting
area ≥95% in solder float test) before use.
Substrate Selection and Quality Control
As the carrier for bumping, the material
properties and surface finish of the SiP substrate directly affect soldering
reliability: Substrate Material Selection: It is recommended to use high Tg
(glass transition temperature ≥170°C) FR-4 or BT resin substrates, ensuring dimensional stability (CTE ≤15 ppm/°C) during reflow soldering high
temperatures (260°C); Surface Finish: ENIG is preferred
for pads, with nickel thickness 5–8Мm (providing a diffusion barrier) and gold thickness 0.05–0.1Мm (ensuring solderability), avoiding
solder joint brittleness caused by excessive gold thickness; Flatness Control:
Overall substrate flatness ≤50 Мm/m, local pad area flatness ≤10 Мm, otherwise leading to excessive variation in solder ball joint
height. Substrate cleaning processes must match the bumping method: Automated
Ball Placement Process: Use ultrasonic cleaning (frequency 40 kHz, time 5
minutes) to remove pad contaminants. After cleaning, water break time should be
≥30 seconds (indicating surface cleanliness); Stencil-based
Ball Placement Process: Bumping must be completed within 12 hours after
cleaning to avoid recontamination; Post-Cleaning Treatment: After soldering
with water-washable flux, clean with deionized water (resistivity ≥18 MΩ·cm), dry at 80–100°C for 30 minutes, ensuring no moisture
residue.
Factors Influencing Bumping Quality and
Control Strategies
Quality control for the SiP bumping process
is a systematic project, requiring the establishment of a control system from
multiple dimensions including materials, equipment, and environment. Key
control points include:
Collaborative Optimization of Process
Parameters
The stability of bumping quality relies on
the precise matching of various parameters. Taking the automated ball placer as
an example: Flux Application Amount: Control the flux mass per pad within the
range of 0.005–0.01 mg. Too much leads to excessive
post-solder residue, too little results in poor ball fixation; Reflow Profile:
The peak reflow temperature for lead-free solder balls is 30–40°C above their melting point (e.g., 250–260°C for Sn96.5Ag3.5 balls), with a soak
time of 60–90 seconds, ensuring full IMC formation;
Nitrogen Flow: The ratio of nitrogen flow rate to chamber volume in the oven
should be ≥5 exchanges/hour, with real-time oxygen
monitoring (alarm threshold ≤100 ppm), ensuring a
stable soldering environment. One company optimized parameters using the DOE
method, reducing the bumping defect rate from 300 ppm to below 50 ppm, with
reflow profile optimization contributing 60% to this improvement.
Mechanism Analysis and Resolution of Common
Defects
Typical defects during the bumping process
require targeted resolution strategies: Solder Ball Misplacement: Primarily
caused by uneven flux application or placement misalignment. By improving the
machining accuracy of the PIN tool (±5Мm) and optimizing the vacuum release speed (increasing from 0.1s to
0.5s), the misplacement rate can be controlled below 10 ppm; Excessive Voiding:
Besides stencil design, internal bubbles in the solder ball are a significant
cause. Strict control of the solder ball manufacturing process (e.g., using
inert gas atomization) is needed to reduce the internal void rate below 0.1%;
Cold Solder Joints: Manifested as discontinuous IMC layer, often caused by pad
oxidation or insufficient flux activity. Adding pad plasma cleaning (power
500W, time 30s) and using fresh flux (within 48 hours of opening) can
effectively resolve this.
Precision Control of Environment and
Equipment
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