Laser ball implantation - bump production process on BGA chip packaging
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Laser ball implantation - bump production process on BGA chip packaging

Замечания:1     创始人: Site Editor     Publish Time: 2026-02-01      Origin: Веб - сайт

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Laser ball implantation technology: high-precision bump manufacturing solution for BGA chip packaging

In the wave of semiconductor packaging technology moving towards high density and miniaturization, ball grid array (BGA) packaging has become the core packaging solution for advanced process chips below 3nm due to its excellent I/O density and electrical performance. According to the latest report from SEMI, the global BGA packaging market will exceed $38 billion in 2023, with high-end products using advanced pelleting processes accounting for 62%. Laser ball implantation technology, a high-precision manufacturing process that has rapidly emerged in recent years, is reshaping the technological landscape of BGA bump manufacturing with a positioning accuracy of ±15μm and a yield performance of 99.9%. This article will systematically analyze the working principle, process characteristics and application boundaries of this technology, and provide a comprehensive technical reference for advanced packaging production lines.

1. Technical background and industry needs

The continuous miniaturization of integrated circuit chips is driving the simultaneous innovation of packaging technology. With over 60 billion transistors integrated into today's state-of-the-art 3nm process chips, this ultra-high integration imposes triple core requirements for I/O interfaces: finer pitch (≤0.3mm), higher coplanarity (≤25μm), and more reliable electrical connections (parasitic inductance <0.5nH). Traditional pelleting processes are gradually showing bottlenecks in responding to these demands: the minimum pitch of the stencil pelleting method is limited by the stencil processing accuracy (≥0.4mm), and the solder paste printing method faces the problem of insufficient ball diameter consistency (deviation > 10%).

The emergence of laser ball implantation technology just fills this technical gap. With the precise energy control of the 1070nm fiber laser, this technology enables stable manufacturing of 50-300μm diameter solder balls, especially for micro devices under the 0201 package size. In high-end applications such as 5G base station RF chips and AI training chips, laser ball implantation has become a key process to ensure signal integrity - test data shows that BGA packages with this technology have 23% lower signal loss in the 10GHz band than traditional processes.

2. Principle and system composition of laser ball implantation technology

The core of laser ball implantation technology is to use the directional energy deposition characteristics of lasers to form spherical bumps on the surface of the pads, and its process essence is to achieve three-dimensional structural shaping by precisely controlling the melt-solidification process of the material.

2.1 Core working principle

The entire process can be divided into four stages:

1. Material preparation stage: Sn-3.5Ag-0.7Cu alloy welding wire (melting point 217°C) is used as raw material, and accurately conveyed to the laser action area at a speed of 5-10mm/s through the wire feeding mechanism. The alloy composition is certified by JEDEC J-STD-006 and offers excellent oxidation resistance and mechanical strength.

2. Laser melting stage: A fiber laser with a wavelength of 1070nm (power 50-150W) is focused into a spot with a diameter of 50-100μm through a galvanometer system, instantly melting the end of the welding wire into droplets in a nitrogen protection atmosphere (oxygen content < 50ppm). The laser pulse width is precisely controlled from 10-50ms, ensuring the formation of volume-stable molten metal balls (mass deviation < 3%).

3. Positioning transfer stage: The molten droplet maintains a spherical shape under the action of surface tension, and the high-precision motion platform (positioning accuracy ±5μm) drives the workpiece table to move, and the droplet is accurately transferred to 0.1-0.3mm above the pad of the preset flux. The flux is formulated in a no-clean formulation of ROL0 grade (< 2% solids) and is applied through a needle dispensing valve (50-150μm diameter).

4. Solidification and molding stage: After the droplet comes into contact with the pad, it is well wetted under the action of flux, and at the same time, it solidifies quickly through inert gas cooling (rate 5-10°C/ms), forming bumps that combine with pad metallurgy. During solidification, a 3-5 μm thick layer of Cu₆Sn₅ intermetallic compounds (IMCs) naturally forms, which is a critical structure that ensures the long-term reliability of solder joints.

2.2 Key components of the system

A complete laser ball implantation system consists of five core modules:

Laser Subsystem: Adopts Q-switched fiber laser, supports continuously adjustable power (10-200W), beam quality M²<1.2, ensures uniform energy distribution (spot energy deviation < 5%).

Motion control subsystem: XYZ three-axis linear motor platform, repeatable positioning accuracy of ±3μm, maximum motion speed 500mm/s, meeting the efficiency needs of mass production.

Visual positioning subsystem: dual CCD camera configuration (up view + down view) with a resolution of 1μm/pixel, with deep learning image algorithms, real-time alignment of the pad with the laser focus (response time < 10ms).

Wire feeding mechanism: Roller type wire feeding driven by servo motor, with a minimum wire feeding volume of 0.01mm, support welding wire specifications with a diameter of 0.1-0.5mm, and a wire feeding accuracy of ±0.005mm.

Environmental Control Module: Includes nitrogen purification system (flow rate 10-30L/min), thermostatic unit (operating temperature 25±1°C), and dust cover (ISO Class 5 cleanliness) to provide a stable microenvironment for the process.

3. Optimization of process parameters and quality control

The quality of laser ball implantation depends on the collaborative control of multiple parameters, and a scientific parameter optimization system needs to be established to achieve high-precision and high-consistency bump manufacturing.

3.1 Influence law of key parameters

500 sets of experiments conducted through the Design of Experiment (DOE) method showed that the following parameters had a significant impact on bump quality:

parameter items

Value range

Impact on quality

Optimize target values

Laser power

50-150W

Too low will cause incomplete melting, and too high will cause spatter

80-100W

Pulse width

10-50ms

Too short forms small balls, and too long causes the pad to overheat

20-30ms

Wire feeding speed

5-10mm/s

It directly determines the size of the ball diameter, and the fluctuation of speed affects the consistency

7±0.2mm/s

The amount of defocus

-0.1-+0.1mm

Affects the energy density distribution of the spot

0±0.02mm

Cooling rate

5-10℃/ms

Internal stress is generated too quickly, and oxidation is caused by too slow

7-8℃/ms

The optimized process parameters can be achieved: ball diameter deviation of ≤±3%, solder ball height consistency of ≤ 5 μm, and alignment error with pad center ≤ 10 μm, fully meeting the requirements of the IPC-7095 standard for Tier 1 packaging.

005

3.2 Typical defect solutions

Possible defects and countermeasures during laser ball implantation are as follows:

Bump deviation: mainly caused by visual positioning error or insufficient platform motion accuracy. The solution includes: visual calibration every hour (deviation compensation < 2μm) and regular testing of the positioning accuracy of the linear motor (once a month).

Uneven ball diameter: usually caused by fluctuations in wire feed speed or instability in laser energy. The standard deviation of the ball diameter can be controlled to less than 2 μm by using a closed-loop controlled wire feed system (feedback frequency 1 kHz) and a laser power monitoring module (sampling rate 10 kHz).

Surface oxidation: It is manifested as a gray area on the surface of the bump, caused by insufficient purity of the shielding gas. It is necessary to ensure that the nitrogen purity ≥ 99.999%, and is monitored in real time by an online oxygen content monitor (accuracy of 1ppm), and automatically alarms when the oxygen content exceeds 30ppm.

Pad damage: Excessive laser energy can cause the pad copper layer to melt. Thermal damage can be avoided by setting the upper limit of the laser power (which dynamically adjusts to the pad size) and introducing infrared temperature monitoring (response time < 1ms).

4. Technical advantages and application scenarios

Compared with traditional ball transplanting processes, laser ball implantation technology shows significant advantages in multiple dimensions, making it an ideal choice for specific application scenarios.

4.1  Core technical advantages

1. Precision breakthrough: The positioning accuracy reaches ±15μm (3σ), which is 60% higher than the template ball planting method, which can meet the manufacturing needs of micro-pitch BGA below 0.3mm. In the production of a 5G RF module, the coplanarity of the weld ball was increased from 45 μm to 20 μm after using this technology, greatly reducing the risk of false soldering in subsequent assembly.

2. Material Savings: By precisely controlling the amount of melt, the material utilization rate reaches more than 95%, reducing solder waste by 40% compared to the solder paste printing method (60-70%). Based on the annual output of 100 million BGAs, the solder cost savings are approximately $2.8 million.

3. Environmental Benefits: No need to use solvent-based fluxes, reducing organic volatile compound (VOC) emissions by more than 60% compared to traditional processes, complying with the requirements of RoHS 2.0 and China's "Pollutant Emission Standards for the Electronics Industry".

4. Flexible production: There is no need to change the template when changing product models, and rapid type change (< 10 minutes) can be achieved by calling different process parameter files, which is especially suitable for multi-variety and small-batch production modes. When a semiconductor packaging plant introduced the technology, product changeover time was reduced from 2 hours to 8 minutes, and equipment utilization was increased by 35%.

4.2 Applicable scenarios and technical boundaries

The best application scenarios for laser ball implantation technology include:

High-end chip packaging: such as CPUs, GPUs, and other devices with high-density I/O, with a solder ball diameter of 100-300μm and a pitch of 0.3-0.8mm. Miniature Sensor Packages: Micro BGAs in medical implantable devices with solder ball diameters as small as 50μm. High-reliability requirements: aerospace electronics, automotive safety chips, etc., products that need to pass AEC-Q100 Grade 0 certification.

The current application boundary of this technology is that when the solder ball diameter exceeds 500 μm, the production efficiency (about 3000 points/hour) is lower than that of the template ball implantation method (10000 points/hour), so it is more suitable for the manufacture of small and medium-sized weld balls.

5. Comparative analysis with other ball planting techniques

In order to more clearly show the positioning of laser ball planting technology, we compare it with the mainstream ball planting process in multiple dimensions:

Evaluation indicators

Laser ball implantation method

Template ball planting method

Solder paste printing method

Electroplating method

Minimum Sphere Diameter (μm)

50

200

150

50

Minimum pitch (μm)

300

400

350

100

Positioning accuracy (μm)

±15

±25

±30

±5

Ball diameter deviation (%)

<3

<5

<10

<2

Capital Investment (USD)

350,000

50,000

30,000

500,000

Cost per Unit (USD)

0.003-0.005

0.001-0.002

0.002-0.003

0.01-0.02

Capacity (dots / hour)

3,000-5,000

10,000-15,000

8,000-10,000

1,000-2,000

Suitable for batches

Medium Volume (1K-10K)

High Volume (>10k)

Small to medium batch (100-5k)

Small Batch (<1k)

It can be seen from the comparison that laser ball implantation has achieved a good balance between precision and cost, especially in scenarios that require both precision and flexibility. Although the electroplating method has the highest precision, the high equipment investment and operating costs make it mainly used in special occasions with ultra-fine pitch (≤ 100μm).

6. Technology development trends and practical suggestions

Laser ball implantation technology is rapidly evolving in the direction of higher precision and efficiency, while making continuous breakthroughs in material adaptation and system integration.

6.1 Future technological breakthroughs

Multi-beam parallel processing: Development of 4-8 laser parallel systems is expected to increase capacity to 20,000 points/hour, close to the efficiency level of the template ball planting method.

Real-time quality monitoring: High-speed visual inspection module with integrated machine learning algorithms enables online identification of bump defects (accuracy > 99.5%) and adaptive adjustment of process parameters.

Low-temperature pelleting process: Research Sn-Bi-In alloys with low melting point (melting point 170-180°C), combined with energy-modulated laser technology, to achieve pelleting processing of temperature-sensitive substrates (such as flexible PI materials).

3D Package Adaptation: Developed tilt angle ball planting function (±45°) to meet the needs of side interconnection in 3D stacked packages, and has achieved stable machining with a 15° tilt angle in the laboratory stage.

6.2 Engineering application suggestions

For enterprises planning to introduce laser ball implantation technology, the following implementation paths are recommended:

1. Equipment Selection: Prioritize fully automated systems with integrated 3D AOI detection capabilities, ensuring closed-loop control from ball planting to inspection. The laser power stability of the device (fluctuation < 2%) and the accuracy of the motion platform were the key indicators to be investigated.

2. Process verification: Conduct temperature and humidity sensitivity level testing in accordance with the JEDEC J-STD-020D standard, with special attention to the reliability performance of 1000 hours in an 85°C/85% RH environment to ensure that the growth thickness of the IMC layer is controlled at 5-8μm.

3. Personnel training: Operation engineers need to be familiar with laser safety specifications (in accordance with IEC 60825-1) and process parameter debugging methods, and it is recommended to pass IPC-A-610 certification training.

4. Cost control: By optimizing laser pulse parameters (e.g., pulse shaping technology) to reduce unit energy consumption, while increasing wire utilization (target > 97%), the cost per piece can be reduced by another 15-20%.

The maturity and popularization of laser ball implantation technology are driving the transformation of BGA packaging from "large-scale production" to "precision manufacturing". In the semiconductor industry's pursuit of "More than Moore", this technology will be deeply integrated with advanced concepts such as heterogeneous integration and chiplets, providing key process support for building electronic systems with higher performance and higher reliability. With the breakthrough of localized equipment (such as the latest laser ball planting machine of China Micro Company has achieved ±20μm accuracy), it is expected that the application cost of this technology will be reduced by more than 40% in the next 3-5 years, further accelerating its large-scale application in consumer electronics, automotive electronics and other fields.

 

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