Замечания:1 创始人: Site Editor Publish Time: 2026-02-03 Origin: Веб - сайт
Introduction: The strategic position of
packaging substrates
In the semiconductor industry chain,
packaging substrates are the key connection hubs between chips and PCBs, and
their technical level directly restricts the high-density integration and system-in-package
(SiP) process of integrated circuits. With the mass production of 3nm process
chips and the maturity of chiplet technology, packaging substrates are
upgrading from traditional "electrical interconnect carriers" to
"system integration platforms", which undertake multiple functions
such as signal transmission optimization, thermal management regulation, and
mechanical support. According to Prismark's 2023 report, the global packaging
substrate market has exceeded $12 billion, with high-end products used in 5G
base stations and autonomous driving chips growing at an annual growth rate of
18%, becoming a new engine for the growth of the semiconductor industry.
1. The core technology system of
packaging substrates
1.1 Functional positioning and
classification architecture
The technological
evolution of packaging substrates has always revolved around the core goal of
"increasing interconnect density", and its three core functions are
differentiated in different application scenarios: Physical support and thermal
management: In high-power device packaging, the substrate needs to have 1.5W/(m・).K) and
above, such as the AlN ceramic substrate used in automotive-grade IGBT modules,
can control the chip junction temperature below 125°C. Electrical interconnect
bridges: In high-frequency scenarios (such as millimeter-wave radar), the
dielectric loss (Df) of the substrate needs to be ≤0.002@10GHz to reduce signal
transmission attenuation. System Integration Platform: By embedding passive
components (resistors, capacitors), the substrate can reduce the module size by
30%, typical applications such as SiP packaging for Apple's M1 Pro chip.
Based on the classification system of the
IEEE 2865 standard, combined with the cross-analysis of connection technology
and application scenarios, a more detailed classification matrix can be
constructed:
|
Types of technology |
Chip-to-substrate connection |
Substrate - PCB connection |
Core technical indicators |
Represents the application |
|
WB-BGA |
Gold wire bonding |
Tin ball array |
Line width / line spacing ≥ 30 μm |
Low-power MCU |
|
FC-CSP |
Copper column bumps |
Micro solder joints |
Line width / line spacing 15-25μm |
Smartphone APs |
|
FC-BGA |
Reverse welding |
Array welding balls |
Line width / line spacing ≤ 10 μm |
Server CPU |
|
RF-SoC substrates |
Ultrasonic bonding |
RF connectors |
The dielectric constant ≤ 3.0 |
5G RF module |
1.2 Flip Chip technology innovation
Flip soldering technology realizes the direct interconnection between the chip and the substrate through copper pillar bumps, which brings revolutionary improvements over traditional wire bonding: Density breakthrough: The use of 40μm pitch copper pillar bumps can achieve an I/O density of 1000+ per square millimeter, which is 5 times higher than WB technology, meeting the high-end chip needs of 3000+ pins. The 10μm copper pillar process used in TSMC's CoWoS packaging pushes interconnect density to a new level. Performance Jump: The signal transmission path is shortened from a few millimeters in the WB to tens of microns in the FC, parasitic inductance is reduced by more than 60%, and signal integrity is improved by 30% at 10GHz high frequencies. The JEDEC JESD22-B104 impact test shows that the FC structure has a mechanical impact resistance of up to 1500G, which is 2.5 times that of the WB structure. Thermal resistance optimization: The thermal conduction efficiency of copper pillar bumps (398W/(m・K)) is much higher than that of gold wire (317W/(m・K)), and with the heat dissipation through-hole design, the thermal resistance of the chip can be reduced by 40%, especially suitable for high-power chips above 300W.

2. Breakthroughs in manufacturing technology and material technology
2.1 Ultra-precision manufacturing
process bottlenecks
The manufacturing of high-end packaging
substrates has entered the era of "micron-level competition", and its
process complexity is comparable to that of semiconductor wafer processing. The
technical indicators of "three highs and two smalls" (high
multi-layer, high density, high reliability, small line width, small
through-hole) put forward the ultimate requirements for processing equipment:
Line processing: Laser direct imaging (LDI) technology is used with negative
photoresist to achieve stable mass production of 5μm line width/line spacing.
ASML's NXE series lithography machine modification model has a line width
control accuracy of up to ±0.5μm to meet the needs of 7nm chip packaging. Through-hole
molding: UV laser drilling technology can process micro-throughs with a
diameter of 15μm, with hole position accuracy controlled within ±3μm. Compared
to conventional mechanical drilling, the efficiency is 8 times higher and there
is no burr residue problem. Interlayer alignment: Adopting a dual-camera
vision alignment system with nanoscale scales, the interlayer alignment
tolerance can be controlled at ±3μm, ensuring the reliability of
interconnection for stacked structures above 16 layers.
Compared with traditional HDI PCBs, the
process accuracy requirements for packaging substrates are increased by an
order of magnitude:
|
Key parameters: |
High-end packaging substrates |
Plain HDI PCB |
Accuracy is increased by multiples |
|
Minimum line width |
5μm |
50μm |
10 times |
|
Through hole diameter |
15μm |
100μm |
6.7 times |
|
Interlayer alignment |
±3μm |
±15μm |
5 times |
|
Media thickness |
10μm |
50μm |
5 times |
|
Surface roughness |
Ra≤0.1μm |
Ra≤1μm |
10 times |
2.2 Technical game of material system
The selection of materials for packaging
substrates needs to find a balance between electrical properties, thermal
stability, and processability, forming a competitive landscape of two
mainstream technical routes: ABF and BT resin:
ABF (Ajinomoto Build-up Film) material
system
Dielectric Properties: Dielectric constant (Dk) 2.9-3.3 and dielectric loss (Df)
0.002-0.004 at 10GHz frequency, suitable for high-speed signal transmission. Thermomechanical
properties: The glass transition temperature (Tg) ≥ 180°C, and the
coefficient of thermal expansion (CTE) above Tg is 50ppm/°C, which
can be reduced to 35ppm/°C by adding SiO₂ packing. Process
Adaptability: Suitable for photosensitive imaging
processes, it can achieve fine line processing below 10μm, and is widely used
in FC-BGA substrates with more than 16 layers. Samsung's latest HBM package
features ABF material for stable interconnection of 8 channels of memory.
BT (Bismaleimide Triazine) resin system
Thermal stability: Tg value can reach more than 220°C, thermal weight loss rate at
150°C < 0.5%/1000h, suitable for automotive-grade high-temperature
environments. Mechanical properties: bending strength ≥ 150MPa,
interlaminar peel strength ≥0.8kN/m, mechanical reliability better than ABF
material. Cost advantage: Compared with ABF materials, BT resin has a
20-30% lower raw material cost and is widely used in consumer electronics, such
as the RF module substrate of Huawei Mate series mobile phones.
Exploration of emerging materials
Low-temperature co-fired ceramics
(LTCC): With dielectric constants as low as 5.0 and
thermal conductivity of up to 3W/(m・K), they excel in mmWave
AiP antenna packages and are used in Apple's iPhone 14's 5G antenna modules. Glass
substrate: Using high-purity glass doped with B₂O₃, with a surface
roughness of Ra≤0.5nm, it can reduce transmission loss to 0.2dB/cm, making it a
potential choice for future terahertz communication.
3. Global market pattern and
localization breakthrough
3.1 Analysis of market competition
situation
The global packaging substrate market
presents a highly concentrated competitive landscape, and leading companies
dominate with technical barriers and scale effects:
1. The first echelon: Japan's Ibiden (23% market share), Taiwan's Unimicron (19%), and South
Korea's SEMCO (20%), controlling a total of 62% of the high-end market share.
These companies have fine wire processing capabilities below 10μm and mainly
supply chip giants such as Intel and Samsung.
2. The second echelon: Taiwan's Xinxing Electronics (12%), Japan's Panasonic (8%), focusing
on the mid-to-high-end market, with technical indicators covering the 15-25μm
line width range.
3. Chinese mainland enterprises: Shennan Circuit (3.2%), Zhuhai Yueya (2.1%), Xingsen Express
(1.5%), mainly concentrated in the low-end field with a line width of more than
25μm, and gradually breaking through in automotive electronics and other market
segments.
The generation gap in technology is the
main gap faced by domestic manufacturers: international leaders have achieved
mass production of 8μm line widths, while the main products of domestic
companies are still at the level of 20-25μm, and the dependence on imports of
equipment (Fujikura's laser drilling machine in Japan accounts for 70% of the
domestic market) is an important constraint.
3.2 The "three-step" strategy
for localization breakthroughs
Based on the domestic industrial base and
market demand, the localization of packaging substrates needs to adopt a
gradual breakthrough strategy:
Step 1: Capacity Building (2023-2025) Focus on building FC-CSP substrate production capacity, aiming to
reach 100,000 square meters/month by 2025 to meet the packaging needs of
domestic smartphone APs and RF chips. Breaking through the 20μm line width
processing process, the yield is increased to more than 90%, and the unit cost
is reduced to less than 1.2 times the international level. The localization
rate of equipment has reached 50%, focusing on breakthroughs in key equipment
such as laser direct imaging machines and vacuum laminators.
Step 2: Technical Tackling (2025-2027)
Tackle ultra-fine line technology below
10μm, develop supporting ultra-thin copper foil (3μm) and high-performance
photoresist, and establish an independent material system. Master the design of
stacked structures with more than 12 layers, develop embedded
resistor/capacitor technology, and increase substrate integration by 40%.
Achieved a breakthrough in the field of automotive-grade BT substrates, passed
AEC-Q200 certification, and entered the supply chain of Tesla and BYD.
Step 3: Ecological Collaboration
(2027-2030)
It has jointly established a joint
laboratory with packaging and testing companies such as Changdian Technology
and Tongfu Microelectronics to develop special substrates for chiplets and
support heterogeneous integration of 1000+I/O. Build an "equipment-material-design-manufacturing"
industry alliance, such as the advanced packaging substrate platform developed
by CLP 58 in cooperation with Huawei HiSilicon. The global market share has
increased to 15%, and import substitution has been achieved in high-end fields
such as 5G base stations and AI chips.
4. Future technology trends and
application expansion
4.1 Chiplet-driven technological change
The maturity of heterogeneous integration
technology is driving the evolution of packaging substrates in the direction of
"ultra-large size, ultra-high layer count, and super function":
Area breakthrough: Expands the size of a single substrate from the traditional 800mm²
to 1200mm², supporting side-by-side integration of multiple chiplets. AMD
MI300X features a 12-layer substrate with an area of 1100mm² and 13 chiplets
integrated. Layer number jump: From the current mainstream 12 layers to
16 or even 20 layers, the interlayer interconnection adopts "laser blind
hole + copper column" hybrid technology, and the through-hole density is
increased to 1000/cm². Functional integration: Embedded silicon
interposer enables 2.5D interconnection with a signal transmission rate of
112Gbps PAM4, which is 3 times faster than traditional gold wire bonding.
TSMC's CoWoS package has enabled the co-design of silicon bridges and
substrates.
4.2 Reliability standard system
construction
With the expansion of application
scenarios, the reliability testing standards of packaging substrates are
becoming more and more perfect, mainly including:
Temperature cycling test: Following JEDEC JESD22-A104 condition B (-55°C~125°C, 1000
cycles), the number of solder joint failures is < 1%, and the IMC layer
thickness is increased by < 2μm. Damp heat aging test: According to
IPC-9701 standard, 85°C/85% RH environment for 1000 hours, insulation
resistance retention rate > 90%, no electrochemical migration phenomenon. Mechanical
reliability test: After vibration test (20-2000Hz, 196m/s²), the resistance
change rate is < 5%; After drop test (1.5m height), there are no structural
cracks.
4.3 Expansion of emerging application
scenarios
Vehicle Radar: 77GHz millimeter-wave radar with LTCC substrate, which can achieve
angular resolution of 0.1°, and the dielectric constant stability of the
substrate in -40°C~125°C environment <±0.1. Quantum computing:
Developing ultra-low loss (<0.1dB/cm) superconducting substrates to support
qubit interconnects in 4K low-temperature environments, IBM quantum computers
have adopted customized packaging substrates. Flexible electronics:
PI-based flexible packaging substrates that can withstand 100,000 bends (5mm
radius of curvature) for biosensor packaging in wearable devices.
epilogue
As a key link in the semiconductor industry
chain, the technical level of packaging substrate directly determines the
system integration capability of integrated circuits. In the face of global
technological competition and domestic demand upgrades, domestic manufacturers
need to achieve collaborative breakthroughs in material systems, manufacturing
equipment, design tools, etc. In the next five years, with the popularization
of chiplet technology and the release of advanced packaging capacity, packaging
substrates will usher in a strategic transformation from "following
innovation" to "leading development", providing core support for
the independent and controllable of China's semiconductor industry.
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